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Proceedings Paper

Laser produced plasma EUV sources for high-volume manufacturing: Performance, availability, and power scaling
Author(s): Igor V. Fomenkov; Alexander A. Schafgans; Michael Purvis; Yezheng Tao; Slava I. Rokitski; Michael Kats; Jayson Stewart; Andrew D. LaForge; Alex I. Ershov; Robert J. Rafac; Silvia De Dea; Mike Vargas; Lukasz Urbanski; Chirag Rajyaguru; Georgiy O. Vaschenko; Joshua M. Lukens; Steven Chang; Ted Taylor; Mathew Abraham; David C. Brandt; Daniel J. Brown
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Paper Details

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Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2282473
Show Author Affiliations
Igor V. Fomenkov, Cymer LLC (United States)
Alexander A. Schafgans, Cymer LLC (United States)
Michael Purvis, Cymer LLC (United States)
Yezheng Tao, Cymer LLC (United States)
Slava I. Rokitski, Cymer LLC (United States)
Michael Kats, Cymer LLC (United States)
Jayson Stewart
Andrew D. LaForge, Univ. of California, San Diego (United States)
Alex I. Ershov, Cymer LLC (United States)
Robert J. Rafac, Cymer LLC, an ASML company (United States)
Silvia De Dea, Cymer LLC (United States)
Mike Vargas, Cymer LLC (United States)
Lukasz Urbanski, Colorado State Univ. (United States)
Chirag Rajyaguru, Cymer LLC (United States)
Georgiy O. Vaschenko, Cymer LLC (United States)
Joshua M. Lukens, Quartus Engineering Inc. (United States)
Steven Chang
Ted Taylor
Mathew Abraham
David C. Brandt, Cymer LLC (United States)
Daniel J. Brown, Cymer LLC (United States)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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