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Proceedings Paper

MTO-like reference mask modeling for advanced inverse lithography technology patterns
Author(s): Jongju Park; Jongin Moon; Suein Son; Donghoon Chung; Byung-Gook Kim; Chan-Uk Jeon; Patrick LoPresti; Shan Xue; Sonny Wang; Bill Broadbent; Soonho Kim; Jiuk Hur; Min Choo
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Paper Abstract

Advanced Inverse Lithography Technology (ILT) can result in mask post-OPC databases with very small address units, all-angle figures, and very high vertex counts. This creates mask inspection issues for existing mask inspection database rendering. These issues include: large data volumes, low transfer rate, long data preparation times, slow inspection throughput, and marginal rendering accuracy leading to high false detections. This paper demonstrates the application of a new rendering method including a new OASIS-like mask inspection format, new high-speed rendering algorithms, and related hardware to meet the inspection challenges posed by Advanced ILT masks.

Paper Details

Date Published: 13 July 2017
PDF: 5 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540J (13 July 2017); doi: 10.1117/12.2282406
Show Author Affiliations
Jongju Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jongin Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Suein Son, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Donghoon Chung, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung-Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Patrick LoPresti, KLA-Tencor Corp. (United States)
Shan Xue, KLA-Tencor Corp. (United States)
Sonny Wang, KLA-Tencor Corp. (United States)
Bill Broadbent, KLA-Tencor Corp. (United States)
Soonho Kim, KLA-Tencor Corp. (United States)
Jiuk Hur, KLA-Tencor Corp. (United States)
Min Choo, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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