Share Email Print
cover

Proceedings Paper

Intelligent ground-rule-based inspection of OPC masks
Author(s): Robert P. Bishop
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Optical proximity correction (OPC) is incorporated in a mask to compensate for the resolution limits of the exposure system. Specific design rules and knowledge about the lens (NA), illumination coherence, and other process parameters are used by the mask designer to determine the type and location of each OPC feature. Beltronics describes how our UVscan System can inspect an OPC mask by intelligently applying the same set of design rules, or a derivative thereof, to inspect the mask. Incorrectly placed, and damaged OPC features are detected without the use of a reference image. Deep UV 248 nm optics are incorporated to obtain 0.125 micron resolution.

Paper Details

Date Published: 8 December 1995
PDF: 9 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228211
Show Author Affiliations
Robert P. Bishop, Beltronics, Inc. (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

© SPIE. Terms of Use
Back to Top