Share Email Print
cover

Proceedings Paper

Low-cost photomask inspection system
Author(s): Damayanti C. Gharpure; Sunil K. David
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The competitive demand for increased production rates and tighter quality control in manufacturing integrated circuits requires inspection at higher speeds, finer resolution and at various stages during fabrication, all at an affordable cost. Manual inspection is tedious and entails a degree of concentration that is difficult to maintain over long periods of time. This paper presents a simple, low cost photo mask inspection system based on an IBM compatible PC. Both the reference comparison as well as feature extraction approaches have been implemented for guaranteed defect detection. The defects are further analyzed to obtain details regarding the location, dimension, and type of defect. The system also generates a diagnostic report providing detailed information regarding each defect, that has been detected, for use in on line mask repair. The paper describes configuration of the system along with the image processing algorithms used. The paper also discusses the results obtained, the specifications and over all performance of the system.

Paper Details

Date Published: 8 December 1995
PDF: 9 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228196
Show Author Affiliations
Damayanti C. Gharpure, Univ. of Poona (India)
Sunil K. David, Univ. of Poona (India)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

© SPIE. Terms of Use
Back to Top