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Proceedings Paper

Powerful inspection and metrology tool for micro- and nanofabrication
Author(s): Shyi-Long Shy; Tan Fu Lei; Kazumitsu Nakamura; Wen-An Loong; Chun-Yen Chang
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Paper Abstract

In this paper, a metrology for micro- and nanofabrication process has been implemented using an atomic force microscope (AFM). Deep submicron patterning on wafer and chromium photomask were done using well established e-beam direct write technology and evaluated using AFM. A fine pitch control method was proposed to fabricate grating pitch mask for the pitch measurement of AFM. It can finely control the grating pitch to 1 nm, less than the most pattern data unit (5 nm) used in electron beam lithography. AFM is a powerful metrology tool for deep submicron process. AFM was employed as an inspection tool for the evidence of the existence of quantum dots on the GaAs substrate, the quantum dots or islands can be inspected clearly. Good performance is obtained.

Paper Details

Date Published: 8 December 1995
PDF: 10 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228195
Show Author Affiliations
Shyi-Long Shy, National Chiao Tung Univ. (Taiwan)
Tan Fu Lei, National Chiao Tung Univ. (Taiwan)
Kazumitsu Nakamura, National Chiao Tung Univ. (Taiwan)
Wen-An Loong, National Chiao Tung Univ. (Taiwan)
Chun-Yen Chang, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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