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GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000
Author(s): Harold Zable; Hironobu Matsumoto; Kenichi Yasui; Ryosuke Ueba; Noriaki Nakayamada; Nagesh Shirali; Yukihiro Masuda; Ryan Pearman; Aki Fujimura
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Paper Abstract

Over the last two decades, eBeam mask writers have added inline correction features. Particularly when minimum feature sizes on mask went below 100nm a decade ago, the need for more precision within a reasonable write time increased the demand for more corrections. Inline correction is better for turnaround time and throughput, but inline correction is computationally limited because it is unacceptable for computation to limit the machine write time.

Simultaneously, the same need for linearity correction, printability enhancement, and resilience to manufacturing variation has caused much innovation in offline mask data preparation and mask process correction. Typically, the writer performs inline correction for backscatter, fogging, loading, charging and thermal effects, but leaves <10μm effects to offline correction.

With multi-beam writers, the write time is independent of shape count. Any set of input shapes is rasterized to a set of arrays of equal sized pixels that are each independently dosed to write the desired shapes. Multi-beam writers also have a certain minimum write time that is required for writing even a very small number of simple shapes. This gives rise to the possibility of providing linearity correction features, even for the short-range effects as inline correction in the writer. Such inline correction has zero impact on throughput and turnaround time of mask making.

This paper introduces the GPU-accelerated inline linearity correction capability of the NuFlare MBM-1000 for the first time.

Paper Details

Date Published: 13 July 2017
PDF: 9 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540D (13 July 2017); doi: 10.1117/12.2281922
Show Author Affiliations
Harold Zable, D2S, Inc. (United States)
Hironobu Matsumoto, NuFlare Technology, Inc. (Japan)
Kenichi Yasui, NuFlare Technology, Inc. (Japan)
Ryosuke Ueba, NuFlare Technology, Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Nagesh Shirali, D2S, Inc. (United States)
Yukihiro Masuda, D2S, Inc. (United States)
Ryan Pearman, D2S, Inc. (United States)
Aki Fujimura, D2S, Inc. (United States)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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