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Proceedings Paper

The role of model-based MPC in advanced mask manufacturing
Author(s): Ingo Bork; Peter Buck
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Paper Abstract

This paper describes the use of model-based MPC in mask manufacturing for the 14 nm technology node and beyond, analyzes the requirements and challenges for introducing MPC and highlights its benefits in the mask manufacturing process.

Paper Details

Date Published: 28 September 2017
PDF: 7 pages
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460B (28 September 2017); doi: 10.1117/12.2281894
Show Author Affiliations
Ingo Bork, Mentor, a Siemens Business (United States)
Peter Buck, Mentor, a Siemens Business (United States)

Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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