MEBES systems are characterized by constituent error performance, whereas masks produced on pattern generators are characterized by composite error performance. System evaluation by constituent specification is notable for the ease with which system calibration can be obtained, monitored, and maintained. Constituent specifications need to be retained for these reasons. This work investigates the composite performance of a MEBES 4500 system when generating masks compared to system constituent performance. Masks with scan-centered and non-scan- centered patterns are characterized and compared with both MEBES-based MARKET metrology and independent tool-based metrology.

Date Published: 8 December 1995
PDF: 8 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228189

Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)