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Proceedings Paper

Investigation of MEBES 4500 system composite performance
Author(s): Jim DeWitt; Joe Watson; David W. Alexander; Allen Cook; Leonard Gasiorek; Mark Mayse; Robert J. Naber; Wayne Phillips; Charles A. Sauer
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Paper Abstract

MEBES systems are characterized by constituent error performance, whereas masks produced on pattern generators are characterized by composite error performance. System evaluation by constituent specification is notable for the ease with which system calibration can be obtained, monitored, and maintained. Constituent specifications need to be retained for these reasons. This work investigates the composite performance of a MEBES 4500 system when generating masks compared to system constituent performance. Masks with scan-centered and non-scan- centered patterns are characterized and compared with both MEBES-based MARKET metrology and independent tool-based metrology.

Paper Details

Date Published: 8 December 1995
PDF: 8 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228189
Show Author Affiliations
Jim DeWitt, Intel Corp. (United States)
Joe Watson, Intel Corp. (United States)
David W. Alexander, Etec Systems, Inc. (United States)
Allen Cook, Etec Systems, Inc. (United States)
Leonard Gasiorek, Etec Systems, Inc. (United States)
Mark Mayse, Etec Systems, Inc. (United States)
Robert J. Naber, Etec Systems, Inc. (United States)
Wayne Phillips, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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