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Proceedings Paper

LMS IPRO: enabling on-device metrology on SiN-based phase-shift masks
Author(s): Hendrik Steigerwald; Runyuan Han; Alexander Buettner; Klaus-Dieter Roeth
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Proc. SPIE 10446, 33rd European Mask and Lithography Conference, ; doi: 10.1117/12.2281885
Show Author Affiliations
Hendrik Steigerwald, KLA-Tencor MIE GmbH (Germany)
Runyuan Han, KLA-Tencor MIE GmbH (Germany)
Alexander Buettner, KLA-Tencor MIE GmbH (Germany)
Klaus-Dieter Roeth, KLA-Tencor MIE GmbH (Germany)


Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Ronald W. Schnabel; Jan Hendrik Peters; Ines A. Stolberg; Hans Loeschner, Editor(s)

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