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Proceedings Paper

Shifter slope variation effect of embedded half-tone phase-shift masks
Author(s): Jongwook Kye; Seong-Yong Moon; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh
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Paper Abstract

We have examined focus behavior and process latitude of contact hole patterns on embedded half-tone phase shifting masks (HT-PSM) with simulation and experimentally measured aerial images. The results of simulation and experiment show that the shifter side-wall profile, transmittance, phase angle of shifter, and thickness affect the aerial image profile. Also, it is found that PSMs are affected by mask topography more than binary intensity masks are. AIMS (aerial image measurement system) measurements and actual experiments confirmed that shifter profiles have an effect on the best focus position, not on the focus latitude.

Paper Details

Date Published: 8 December 1995
PDF: 9 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228187
Show Author Affiliations
Jongwook Kye, Samsung Electronics Co., Ltd. (South Korea)
Seong-Yong Moon, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Young-Bum Koh, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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