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Proceedings Paper

Side-lobe suppression in halftone PSM with optical proximity correction
Author(s): In-Gyun Shin; Sung-Chul Lim; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh
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Paper Abstract

We simulated half-tone phase shifting masks (HT-PSMs) with dummy patterns where side-lobe effects occur. The result is that 180 degree phase angle dummy patterns between contact holes help to reduce side-lobe effects without losing peak intensities of mask patterns. We prepared experimental masks according to the optimum results of simulation, and the actual experiment produced the same results reducing side-lobe effects as the simulation.

Paper Details

Date Published: 8 December 1995
PDF: 9 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228182
Show Author Affiliations
In-Gyun Shin, Samsung Electronics Co., Ltd. (South Korea)
Sung-Chul Lim, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Young-Bum Koh, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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