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Proceedings Paper

Fabrication processes for SCALPEL mask blanks
Author(s): Harold A. Huggins; Kevin J. Bolan; James Alexander Liddle; Milton L. Peabody; Regine G. Tarascon-Auriol; David L. Windt
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Paper Abstract

SCALPELTM, (scanning with angular limitation projection electron-beam lithography) is a projection electron-beam lithography technique with the potential for high resolution and throughput that can extend the state of lithography below 0.18 micrometer. The success of this technology, developed at AT&T , is directly connected to the ability to manufacture a robust SCALPEL mask blank. An error budget analysis has been performed on the SCALPEL mask. This analysis has generated specific requirements for the mask blank. In this paper we discuss their impact on the mask blank fabrication and show that we are making good progress towards meeting these requirements.

Paper Details

Date Published: 8 December 1995
PDF: 9 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228176
Show Author Affiliations
Harold A. Huggins, AT&T Bell Labs. (United States)
Kevin J. Bolan, AT&T Bell Labs. (United States)
James Alexander Liddle, AT&T Bell Labs. (United States)
Milton L. Peabody, AT&T Bell Labs. (United States)
Regine G. Tarascon-Auriol, AT&T Bell Labs. (United States)
David L. Windt, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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