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Proceedings Paper

Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session
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Paper Abstract

We report here survey and discussion results on mask accuracy and mask size at the 1995 PMJ (Photomask Japan) Rump Session. The questionnaires consist of mask size, lithography error budget, and mask error budget for 64M DRAM, 256M DRAM, and 1G DRAM. The number of replies was 52, 26 in advance and 26 on site. Seven panelists presented short papers on mask accuracy from the technical fields of device, lithography, mask making, and mask- related equipment. The discussion results of panelists also are shown.

Paper Details

Date Published: 8 December 1995
PDF: 12 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228173
Show Author Affiliations
Yoshihiro Todokoro, Matsushita Electronics Corp. (Japan)
Hiroaki Morimoto, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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