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Proceedings Paper

Inspection system qualification and integration into the mask manufacturing environment
Author(s): Rosanne LaVoy; Ron Fujioka
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Paper Abstract

Integration of a mask inspection system into a manufacturing environment poses new challenges to both the inspection engineer and the equipment supplier. Traditional specifications (limited primarily to sensitivity and uptime) are no longer sufficient to successfully integrate a system into a 7 by 24 manufacturing area with multiple systems. Issues such as system sensitivity matching, sensitivity characterization by defect type, operator training and certification standards, and real-time SPC control of the systems must be addressed. This paper outlines some of the techniques Intel Mask Operation uses for integration of a new inspection system into the manufacturing line. Specifically moving a beta- site type tool out of the beta-site mode and into volume production. Examples are presented, including installation for manufacturing (including ergonomic modifications), techniques for system-to-system matching, use of SPC charts to monitor system performance, and operator training/certifications. Relationships between system PMs, or other environmental changes, and the system sensitivity SPC control charts also are discussed.

Paper Details

Date Published: 8 December 1995
PDF: 11 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228164
Show Author Affiliations
Rosanne LaVoy, Intel Corp. (United States)
Ron Fujioka, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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