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Proceedings Paper

Photomask production integration of KLA STARlight 300 system
Author(s): Franklin D. Kalk; David Mentzer; Anthony Vacca
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Paper Abstract

This paper describes the use of the KLA STARlightTM 300 inspection system for advanced photomask manufacturing and development. STARlight's combination of state-of- the-art defect detectivity and high speed helps to streamline final mask inspection and improve product quality. For advanced development, previously undetected defects can now be identified, their effects on printability can be quantified, and strategies to eliminate them can be implemented.

Paper Details

Date Published: 8 December 1995
PDF: 10 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228162
Show Author Affiliations
Franklin D. Kalk, DuPont Photomasks, Inc. (United States)
David Mentzer, DuPont Photomasks, Inc. (United States)
Anthony Vacca, KLA Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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