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Proceedings Paper

Investigation of GMC for CD uniformity benefits
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Paper Abstract

Long used as a replacement for COP in making 1:1 photomasks, poly(glycidyl methacrylate- co-3-chlorostyrene) (GMC), a negative acting e-beam sensitive resist, has recently been under investigation for additional applications, such as tight tolerance CD masks and 5X reticles. The process for GMC is straightforward and resilient within a manufacturing operation. In addition, the required process dose of 2.5 (mu) C/c2 does not affect exposure time in a limiting way. This study has demonstrated CD uniformity less than 30 nm 3-sigma and showing no CD deviation from 50% - 150% of nominal develop time. GMC shows linear CD growth with over-exposure in the range from 80% to 200% of nominal, with X vs. Y CD tuning accomplished by the use of MEBES auto-tap blanker setting. Preliminary defect results are presented and conclusions are drawn that consider GMC as an easy to use alternative for critical CD layers.

Paper Details

Date Published: 8 December 1995
PDF: 13 pages
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228161
Show Author Affiliations
Christopher P. Braun, AT&T Microelectronics (United States)
Michael W. Stohl, AT&T Microelectronics (United States)
Anthony E. Novembre, AT&T Bell Labs. (United States)
Frederick R. Peiffer, AT&T Microelectronics (United States)


Published in SPIE Proceedings Vol. 2621:
15th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James N. Wiley, Editor(s)

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