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Proceedings Paper

New EUV reference photomask standard for CD metrology: enter the 3D nanometrolgy era
Author(s): Annemarie Benedikt; Sebastian Lipfert; Gaoliang Dai; Kai Haim; Harald Bosse; Albrecht Ullrich
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Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2281603
Show Author Affiliations
Annemarie Benedikt, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Sebastian Lipfert, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)
Gaoliang Dai, Physikalisch-Technische Bundesanstalt (Germany)
Kai Haim, Physikalisch-Technische Bundesanstalt (Germany)
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)
Albrecht Ullrich, Advanced Mask Technology Ctr. GmbH Co. KG (Germany)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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