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Proceedings Paper

Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Author(s): Ivan Pollentier; Yannick Vesters; Jing Jiang; Pieter Vanelderen; Danilo De Simone
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Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2281449
Show Author Affiliations
Ivan Pollentier, IMEC (Belgium)
Yannick Vesters, IMEC (Belgium)
KU Leuven (Belgium)
Jing Jiang, IMEC (Belgium)
Pieter Vanelderen, IMEC (Belgium)
Danilo De Simone, IMEC (Belgium)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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