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Data preparation in the age of curvilinear patterns
Author(s): Sébastien Bayle; Charles Tiphine; Matthieu Milléquant; Thiago Figueiro; Luc Martin; Sergei Postnikov; Patrick Schiavone
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Paper Abstract

The number of curvilinear patterns present on the masks will increase drastically in the next generations of semiconductor devices. Multibeam mask writers are foreseen to enable a more widespread use of curvilinear shapes. Several applications can benefit from curvilinear patterns like silicon photonics or Inverse Lithography Technology (ILT). We propose a set of innovative algorithms that uses a dedicated representation for curvilinear patterns. This approach simplifies the data handling and decreases file size by reducing the degree of freedom on the database. It also allows improving the output quality with a more precise control of the geometric correction. We illustrate the benefit of using the curvilinear data representation to the Mask Proximity correction and Mask Rule Check.

Paper Details

Date Published: 13 July 2017
PDF: 6 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540H (13 July 2017); doi: 10.1117/12.2280704
Show Author Affiliations
Sébastien Bayle, ASELTA Nanographics (France)
Charles Tiphine, ASELTA Nanographics (France)
Matthieu Milléquant, ASELTA Nanographics (France)
Thiago Figueiro, ASELTA Nanographics (France)
Luc Martin, ASELTA Nanographics (France)
Sergei Postnikov, ASELTA Nanographics (France)
Patrick Schiavone, ASELTA Nanographics (France)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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