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Proceedings Paper

Lifetime impact on residual stress of EUV pellicle
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Paper Abstract

Since EUV pellicle is very thin, It can be affected easily on its manufacturing process or the exposure process. The Pellicle has several types of stress, above all the pellicle has a residual stress from its manufacturing process. To determine the effect of residual stress on the pellicle, we calculated residual stress of several types of multi-layer pellicle by using formula. We could confirm that the residual stress has non-negligible values through the calculation results, and we obtained the thermal stress of each pellicle by using finite element method (FEM). we optimized the pellicle through comparison of total stress by plus the calculated residual stress and the thermal stress. As a result, since the p-Si core pellicle with B4C capping satisfies both high transparent and low total stress, we chose p-Si core pellicle with B4C capping as a suitable pellicle.

Paper Details

Date Published: 16 October 2017
PDF: 7 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501O (16 October 2017); doi: 10.1117/12.2280692
Show Author Affiliations
Min-Woo Kim, Hanyang Univ. (Korea, Republic of)
Sung-Gyu Lee, Hanyang Univ. (Korea, Republic of)
Eun-Sang Park, Hanyang Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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