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Proceedings Paper

Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow
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Paper Abstract

To protect the extreme-ultraviolet (EUV) mask from contaminations, the EUV pellicle is required. Internal temperature of EUV pellicle is increased during exposure process and then, thermal stress is also varied owing to increased temperature of EUV pellicle, so that the EUV pellicle will be broken. The cooling system by hydrogen gas (H2) flow is used to reduce internal temperature of EUV pellicle during exposure process. In order to determine the effect of cooling, we simulated variation of temperature and thermal stress for EUV pellicle membranes by using finite element method (FEM). Also, we considered a film coefficient with a few nanometer EUV pellicle thickness as simulation parameter. As a result, we determined that the cooling system of EUV pellicle by using H2 flow is efficient to decrease temperature and thermal stress of EUV pellicle during exposure process.

Paper Details

Date Published: 16 October 2017
PDF: 7 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501N (16 October 2017); doi: 10.1117/12.2280691
Show Author Affiliations
Myung-Gi Kang, Hanyang Univ. (Korea, Republic of)
Sung-Gyu Lee, Hanyang Univ. (Korea, Republic of)
Eun-Sang Park, Hanyang Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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