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Proceedings Paper

Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production
Author(s): Dirk Hellweg; Martin Dietzel; Renzo Capelli; Conrad Wolke; Grizelda Kersteen; Markus Koch; Ralf Gehrke
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Paper Abstract

Actinic review of potential defect sites and verification of their repair is a key step in producing defect free masks. The AIMSTM systems are the industry proven standard for this task and the AIMSTM EUV has been developed to provide this functionality for EUV masks. Thereby it closes an important gap in the EUV mask infrastructure for volume production. In this paper, we show the readiness of the AIMSTM EUV for defect review and verification, and discuss the use of actinic aerial image metrology beyond this core application. In particular, we show measurements on mask 3D effects and the contribution of photon stochastics on wafer local CDU.

Paper Details

Date Published: 16 October 2017
PDF: 11 pages
Proc. SPIE 10451, Photomask Technology, 104510J (16 October 2017); doi: 10.1117/12.2280689
Show Author Affiliations
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Martin Dietzel, Carl Zeiss SMT GmbH (Germany)
Renzo Capelli, Carl Zeiss SMT GmbH (Germany)
Conrad Wolke, Carl Zeiss SMT GmbH (Germany)
Grizelda Kersteen, Carl Zeiss SMT GmbH (Germany)
Markus Koch, Carl Zeiss SMT GmbH (Germany)
Ralf Gehrke, Carl Zeiss SMT GmbH (Germany)

Published in SPIE Proceedings Vol. 10451:
Photomask Technology
Peter D. Buck; Emily E. Gallagher, Editor(s)

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