Share Email Print

Proceedings Paper

Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production
Author(s): Martin Dietzel; Renzo Capelli; Dirk Hellweg; Markus Bauer; Conrad Wolke; Grizelda Kersteen
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
Proc. SPIE 10451, Photomask Technology, ; doi: 10.1117/12.2280689
Show Author Affiliations
Martin Dietzel, Carl Zeiss SMT GmbH (Germany)
Renzo Capelli, Carl Zeiss SMT GmbH (Germany)
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Markus Bauer, Carl Zeiss SMT GmbH (Germany)
Conrad Wolke, Carl Zeiss SMT GmbH (Germany)
Grizelda Kersteen, Carl Zeiss SMT GmbH (Germany)

Published in SPIE Proceedings Vol. 10451:
Photomask Technology
Peter D. Buck; Emily E. Gallagher, Editor(s)

© SPIE. Terms of Use
Back to Top