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Proceedings Paper

Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements
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Paper Abstract

In order to reduce the fabrication time of the diffractive optical elements (DOEs), a new process is proposed by combining the laser ablation phenomenon using the laser intensity in the conventional thermochemical process. The basic mechanism of the proposed method and experimental results are also presented. We confirmed the effect of reducing the movement distance of the stage for the production of the overall lithography when we made repetitive square patterns. The time reduction rate is drastically improved when the number of patterns is increased. Various patterns including rectangular, triangular, parallelogram, and diamond shape were fabricated by using the proposed method.

Paper Details

Date Published: 16 October 2017
PDF: 6 pages
Proc. SPIE 10451, Photomask Technology, 104511R (16 October 2017); doi: 10.1117/12.2280620
Show Author Affiliations
Young-Gwang Kim, Univ. of Science and Technology (Korea, Republic of)
Korea Research Institute of Standards and Science (Korea, Republic of)
Hyug-Gyo Rhee, Univ. of Science and Technology (Korea, Republic of)
Korea Research Institute of Standards and Science (Korea, Republic of)
Young-Sik Ghim, Univ. of Science and Technology (Korea, Republic of)
Korea Research Institute of Standards and Science (Korea, Republic of)
Ho-Soon Yang, Korea Research Institute of Standards and Science (Korea, Republic of)
Yun-Woo Lee, Korea Research Institute of Standards and Science (Korea, Republic of)


Published in SPIE Proceedings Vol. 10451:
Photomask Technology
Peter D. Buck; Emily E. Gallagher, Editor(s)

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