Share Email Print

Proceedings Paper

Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection
Author(s): Sung-Gyu Lee; Guk-Jin Kim; Su-Mi Hur; Hye-Keun Oh
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The extreme-ultraviolet (EUV) mask cannot be inspected by using actinic inspection system because there is no commercial EUV actinic mask inspection system available yet. Moreover, the EUV pellicle must be removed if the EUV mask is inspected by non-actinic inspection system, so that a novel EUV pellicle membrane is required to inspect the EUV mask without EUV pellicle removal in the non-actinic inspection system. We have attempted to find an optimum combination as the multi-stack EUV pellicle membrane which can obtain not only high EUV transmission but also high deep-ultraviolet (DUV) transmission. Graphite- and silicon nitride (SiNx)-based EUV pellicle membrane have a larger DUV intensity after passing through optics than those of silicon-based pellicle membranes. Based on these results, we believe that these multi-stack EUV pellicle membranes have high DUV transmission as well as EUV transmission and it would make better performance with respect to fidelity of through-pellicle inspection compared to well-known EUV pellicle membranes.

Paper Details

Date Published: 16 October 2017
PDF: 8 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501M (16 October 2017); doi: 10.1117/12.2280618
Show Author Affiliations
Sung-Gyu Lee, Hanyang Univ. (Korea, Republic of)
Guk-Jin Kim, Hanyang Univ. (Korea, Republic of)
Su-Mi Hur, Chonnam National Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top