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Proceedings Paper

Estimated mask contours: potential applications
Author(s): John Gookassian; Carlos Rojas
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Paper Abstract

Mask writers have evolved significantly in the last decade, and many modern ones include some level of process error correction. However, the feature sizes were shrinking at even faster rate, so the ratio of error to feature size has grown to a level that can no longer be ignored. Even “ideal” process will still produce some rounded contours on the mask. This paper discusses potential applications for the mask contour approximation, such as manufacturing rule check, inspection, metrology and mask error correction. We also discuss and compare possible approaches to generate the mask contours.

Paper Details

Date Published: 16 October 2017
PDF: 6 pages
Proc. SPIE 10451, Photomask Technology, 104510Y (16 October 2017); doi: 10.1117/12.2280608
Show Author Affiliations
John Gookassian, Synopsys, Inc. (United States)
Carlos Rojas, Synopsys, Inc. (Chile)

Published in SPIE Proceedings Vol. 10451:
Photomask Technology
Peter D. Buck; Emily E. Gallagher, Editor(s)

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