Share Email Print
cover

Proceedings Paper

Improved cost-of-ownership for a droplet-based LPP light source for HVM EUV mask and blank inspection
Author(s): Markus Brandstätter; Marco M. Weber; Duane Hudgins; Jeremy Nickol; Flori Alickaj; Reza S. Abhari
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2280597
Show Author Affiliations
Markus Brandstätter, ETH Zürich (Switzerland)
Marco M. Weber, ETH Zürich (Switzerland)
Duane Hudgins, ETH Zürich (Switzerland)
Jeremy Nickol, ETH Zürich (Switzerland)
Flori Alickaj, ETH Zürich (Switzerland)
Reza S. Abhari, ETH Zürich (Switzerland)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top