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Proceedings Paper

Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet
Author(s): Lukas Bahrenberg; Serhiy Danylyuk; Sascha Brose; Ivan Pollentier; Marina Timmermans; Emily Gallagher; Jochen Stollenwerk; Peter Loosen
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Paper Abstract

In this paper, studies on the characterization of pellicle membranes with a lab-based spectroscopic reflectometer operated in the extreme ultraviolet (EUV) spectral range from 8.7 nm to 15 nm are presented. This includes the actinic wavelength of EUV lithography at 13.5 nm for high volume manufacturing as well as its neighboring spectral bands. The tool can perform spectroscopic measurements of reflectance under adjustable incidence angles of grazing illumination, ranging from 5° to 12°. Additionally, spectroscopic measurements of transmittance under normal incidence for thin membranes ⪅ 100 nm can be performed. By acquisition of a data set of transmittance and reflectance values, membranes are characterized with respect to their optical constants and their dimensional parameters such as thickness and roughness by means of reconstruction. From reconstructed optical constants further properties such as density and stoichiometry can be derived.

Paper Details

Date Published: 16 October 2017
PDF: 7 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501L (16 October 2017); doi: 10.1117/12.2280579
Show Author Affiliations
Lukas Bahrenberg, RWTH Aachen Univ. (Germany)
JARA – Fundamentals of Future Information Technology (Germany)
Serhiy Danylyuk, RWTH Aachen Univ. (Germany)
JARA – Fundamentals of Future Information Technology (Germany)
Sascha Brose, RWTH Aachen Univ. (Germany)
JARA – Fundamentals of Future Information Technology (Germany)
Ivan Pollentier, IMEC (Belgium)
Marina Timmermans, IMEC (Belgium)
Emily Gallagher, IMEC (Belgium)
Jochen Stollenwerk, RWTH Aachen Univ. (Germany)
JARA – Fundamentals of Future Information Technology (Germany)
Fraunhofer Institute for Laser Technology (Germany)
Peter Loosen, RWTH Aachen Univ. (Germany)
JARA – Fundamentals of Future Information Technology (Germany)
Fraunhofer Institute for Laser Technology (Germany)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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