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Proceedings Paper

Integral inband EUV reflectometry: Supplementing spectral reflectometry with fast full area mapping on masks and blanks
Author(s): Rainer Lebert; Christoph Phiesel; Andreas Biermanns-Foeth; Thomas Missalla; Christian Pampfer; Christian Piel
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Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2280563
Show Author Affiliations
Rainer Lebert, RI Research Instruments GmbH (Germany)
Christoph Phiesel, RI Research Instruments GmbH (Germany)
Andreas Biermanns-Foeth, RI Research Instruments GmbH (Germany)
Thomas Missalla, RI Research Instruments GmbH (Germany)
Christian Pampfer, RI Research Instruments GmbH (Germany)
Christian Piel, RI Research Instruments GmbH (Germany)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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