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Proceedings Paper

Irradiation damage test of Mo/Si, Ru/Si, and Nb/Si multilayers using coherent EUV lasers
Author(s): Masaharu Nishikino; Satoshi Ichimaru; Masahiko Ishino; Masatoshi Hatayama; Satoshi Oku; Hiroo Kinoshita
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Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, ; doi: 10.1117/12.2280540
Show Author Affiliations
Masaharu Nishikino, National Institutes for Quantum and Radiological Science and Technology (Japan)
Satoshi Ichimaru, NTT Advanced Technology Corp. (Japan)
Masahiko Ishino, National Institutes for Quantum and Radiological Science and Technology (Japan)
Masatoshi Hatayama, NTT Advanced Technology Corp. (Japan)
Satoshi Oku, NTT Advanced Technology Corp. (Japan)
Hiroo Kinoshita, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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