Share Email Print

Proceedings Paper

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The analysis of the thermal stress and the extreme-ultraviolet (EUV) pellicle is important since the pellicle could be easily damaged since the thickness of the pellicle is 50 nm thin due to 90% required EUV transmission. One of the solution is using a high emissivity metallic material on the both sides of the pellicle and it can lower the thermal stress. However, using a metallic coating on pellicle core which is usually consist of silicon group can decrease the EUV transmission compared to using a single core layer pellicle only. Therefore, we optimized thermal and optical properties of the pellicle and elect three types of the pellicle. In this paper we simulated our optimized pellicles with 500W source power. The result shows that the difference of the thermal stress is small for each case. Therefore, our result also shows that using a high emissivity coating is necessary since the cooling of the pellicle strongly depends on emissivity and it can lower the stress effectively even at high EUV source power.

Paper Details

Date Published: 16 October 2017
PDF: 6 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501K (16 October 2017); doi: 10.1117/12.2280518
Show Author Affiliations
Eun-Sang Park, Hanyang Univ. (Korea, Republic of)
Chung-Hyun Ban, Hanyang Univ. (Korea, Republic of)
Jae-Hun Park, Hanyang Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

© SPIE. Terms of Use
Back to Top