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Proceedings Paper

Key components development progress updates of the 250W high power LPP-EUV light source
Author(s): Takayuki Yabu; Yasufumi Kawasuji; Tsukasa Hori; Takeshi Okamoto; Hiroshi Tanaka; Kenichi Miyao; Takuya Ishii; Yukio Watanabe; Tatsuya Yanagida; Yutaka Shiraishi; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Taku Yamazaki; Noritoshi Itou; Takashi Saito; Hakaru Mizoguchi
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Paper Abstract

Gigaphoton Inc. is developing a CO2-Sn-LPP EUV light source based on unique and original technologies including a high power CO2laser with 15 nanosecond pulse duration, a solid-state pre-pulse laser with 10 picosecond pulse duration, a highly stabilized droplet generator, a precise laser-droplet shooting control system and a debris mitigation system using a magnetic field. In this paper, an update of the development progress of our 250W CO2-Sn-LPP EUV light source and of the key components is presented.

Paper Details

Date Published: 16 October 2017
PDF: 12 pages
Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501C (16 October 2017); doi: 10.1117/12.2280503
Show Author Affiliations
Takayuki Yabu, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takeshi Okamoto, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Kenichi Miyao, Gigaphoton Inc. (Japan)
Takuya Ishii, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Tatsuya Yanagida, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Noritoshi Itou, Gigaphoton Inc. (Japan)
Takashi Saito, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 10450:
International Conference on Extreme Ultraviolet Lithography 2017
Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani, Editor(s)

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