Share Email Print
cover

Proceedings Paper

Metrology for the manufacturing of freeform optics
Author(s): Todd Blalock; Brian Myer; Ian Ferralli; Matt Brunelle; Tim Lynch
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Recently the use of freeform surfaces have become a realization for optical designers. These non-symmetrical optical surfaces have allowed unique solutions to optical design problems. The implementation of freeform optical surfaces has been limited by manufacturing capabilities and quality. However over the past several years freeform fabrication processes have improved in capability and precision. But as with any manufacturing, proper metrology is required to monitor and verify the process. Typical optics metrology such as interferometry has its challenges and limitations with the unique shapes of freeform optics. Two contact metrology methods for freeform metrology are presented; a Leitz coordinate measurement machine (CMM) with an uncertainty of ± 0.5 μm and a high resolution profilometer (Panasonic UA3P) with a measurement uncertainty of ± 0.05 μm. We are also developing a non-contact high resolution technique based on the fringe reflection technique known as deflectometry. This fast non-contact metrology has the potential to compete with accuracies of the contact methods but also can acquire data in seconds rather than minutes or hours.

Paper Details

Date Published: 16 October 2017
PDF: 7 pages
Proc. SPIE 10448, Optifab 2017, 1044817 (16 October 2017); doi: 10.1117/12.2279819
Show Author Affiliations
Todd Blalock, Optimax Systems, Inc. (United States)
Brian Myer, Optimax Systems, Inc. (United States)
Ian Ferralli, Optimax Systems, Inc. (United States)
Matt Brunelle, Optimax Systems, Inc. (United States)
Tim Lynch, Optimax Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 10448:
Optifab 2017
Julie L. Bentley; Sebastian Stoebenau, Editor(s)

© SPIE. Terms of Use
Back to Top