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Proceedings Paper

Novel process for production of micro lenses with increased centering accuracy and imaging performance
Author(s): C. Wilde; P. Langehanenberg; T. Schenk
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Paper Abstract

For modern production of micro lens systems, such as cementing of doublets or more lenses, precise centering of the lens edge is crucial. Blocking the lens temporarily on a centering arbor ensures that the centers of all optical lens surfaces coincide with the lens edge, while the arbor’s axis serves as reference for both alignment and edging process.

This theoretical assumption of the traditional cementing technology is not applicable for high-end production. In reality cement wedges between the bottom lens surface and the arbor’s ring knife edge may occur and even expensive arbors with single-micron precision suffer from reduced quality of the ring knife edge after multiple usages and cleaning cycles. Consequently, at least the position of the bottom lens surface is undefined and the optical axis does not coincide with the arbor’s reference axis!

In order to overcome this basic problem in using centering arbors, we present a novel and efficient technique which can measure and align both surfaces of a lens with respect to the arbor axis with high accuracy and furthermore align additional lenses to the optical axis of the bottom lens. This is accomplished by aligning the lens without mechanical contact to the arbor. Thus the lens can be positioned in four degrees of freedom, while the centration errors of all lens surfaces are measured and considered. Additionally the arbor’s reference axis is not assumed to be aligned to the rotation axis, but simultaneously measured with high precision.

Paper Details

Date Published: 16 October 2017
PDF: 10 pages
Proc. SPIE 10448, Optifab 2017, 104480L (16 October 2017); doi: 10.1117/12.2279801
Show Author Affiliations
C. Wilde, TRIOPTICS GmbH (Germany)
P. Langehanenberg, TRIOPTICS GmbH (Germany)
T. Schenk, TRIOPTICS GmbH (Germany)


Published in SPIE Proceedings Vol. 10448:
Optifab 2017
Julie L. Bentley; Sebastian Stoebenau, Editor(s)

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