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Proceedings Paper

Prospects for the enhancement of PIAD processes by plasma diagnostics
Author(s): Jens Harhausen; Rüdiger Foest; Jochen Wauer; Olaf Stenzel; Steffen Wilbrandt; Christian Franke; Moritz Oberberg; Ralf P. Brinkmann
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Paper Abstract

The purpose of this paper is to present concepts for an improved control of plasma ion assisted deposition (PIAD) processes which are employed for the production of optical interference coatings. While the well established PIAD technique typically comprises methods for in situ monitoring of thin film properties, there is no detailed knowledge about plasma parameters which are the foundation of magnitude and stability of plasma assistance, however. We adopt optical emission spectroscopy (OES) and active plasma resonance spectroscopy (APRS) and present schemes for controlling radiance and electron density on a batch coater equipped with an Advanced Plasma Source (APS). In a repeatability experiment of a 5-layer quarterwave stack (QWS, SiO2/TiO2), characteristics of two plasma based control schemes are compared to those of a conventional approach. For the conventional process we find systematic drifts and shifts in time traces of monitored plasma paramaters which correlate to properties of the layer stack. By using the novel concepts, stability of plasma paramaters can be improved by a factor of up to 6, while repeatability of in situ QWS transmission is strongly enhanced, exhibiting no spectral shift and minimal variation in reflectivity.

Paper Details

Date Published: 16 October 2017
PDF: 15 pages
Proc. SPIE 10448, Optifab 2017, 104481T (16 October 2017); doi: 10.1117/12.2279800
Show Author Affiliations
Jens Harhausen, Leibniz-Institut für Plasmaforschung und Technologie (Germany)
Rüdiger Foest, Leibniz-Institut für Plasmaforschung und Technologie (Germany)
Jochen Wauer, Leibniz-Institut für Plasmaforschung und Technologie (Germany)
Olaf Stenzel, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Steffen Wilbrandt, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Christian Franke, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Moritz Oberberg, Ruhr-Univ. Bochum (Germany)
Ralf P. Brinkmann, Ruhr-Univ. Bochum (Germany)


Published in SPIE Proceedings Vol. 10448:
Optifab 2017
Julie L. Bentley; Sebastian Stoebenau, Editor(s)

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