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Analysis and optimization of surface profile correcting mechanism of the pitch lap in large-aperture annular polishing
Author(s): Huifang Zhang; Minghong Yang; Xueke Xu; Lunzhe Wu; Weiguang Yang; Jianda Shao
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Paper Abstract

The surface figure control of the conventional annular polishing system is realized ordinarily by the interaction between the conditioner and the lap. The surface profile of the pitch lap corrected by the marble conditioner has been measured and analyzed as a function of kinematics, loading conditions, and polishing time. The surface profile measuring equipment of the large lap based on laser alignment was developed with the accuracy of about 1μm. The conditioning mechanism of the conditioner is simply determined by the kinematics and fully fitting principle, but the unexpected surface profile deviation of the lap emerged frequently due to numerous influencing factors including the geometrical relationship, the pressure distribution at the conditioner/lap interface. Both factors are quantitatively evaluated and described, and have been combined to develop a spatial and temporal model to simulate the surface profile evolution of pitch lap. The simulations are consistent with the experiments. This study is an important step toward deterministic full-aperture annular polishing, providing a beneficial guidance for the surface profile correction of the pitch lap.

Paper Details

Date Published: 16 October 2017
PDF: 10 pages
Proc. SPIE 10448, Optifab 2017, 1044804 (16 October 2017); doi: 10.1117/12.2279771
Show Author Affiliations
Huifang Zhang, Shanghai Univ. (China)
Minghong Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Xueke Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Lunzhe Wu, Shanghai Institute of Optics and Fine Mechanics (China)
Weiguang Yang, Shanghai Univ. (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 10448:
Optifab 2017
Julie L. Bentley; Sebastian Stoebenau, Editor(s)

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