Share Email Print
cover

Proceedings Paper

Characterizing electron beam induced damage in metrology and inspection of advance devices
Author(s): Abbas Mohtashami; Violeta Navarro; Hamed Sadeghian; Ilan Englard; Dror Shemesh; Nitin Singh Malik
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Using the electron beam (e-beam) as an advanced metrology tool in semiconductor manufacturing technologies has attracted many interests in the recent years. Owing to its high resolution and transparency to a wide range of materials including the metals, the e-beam shows a great promise to be used individually or in combination with the current optical metrology techniques in semiconductor industries. However, the e-beam can cause damages to the materials under inspection due to its relatively high energy. Therefore, determining the amount and type of damage as a result of the e-beam exposure is critical. Here, we present scanning probe microscopy techniques with the capability of measuring the e-beam induced damages on various materials. The experimental results of the e-beam induced damages on 300 mm silicon wafers covered by 1) patterned low-k material and 2) patterned low-k material filled with copper metal after chemical-mechanical polishing treatment are discussed. This method can be considered as a complementary approach to e-beam to ensure minimizing damage to the features.

Paper Details

Date Published:
PDF
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, ; doi: 10.1117/12.2279707
Show Author Affiliations
Abbas Mohtashami, Netherlands Organization for Scientific Applied Research, TNO (Netherlands)
Violeta Navarro, Netherlands Organization for Scientific Applied Research, TNO (Netherlands)
Hamed Sadeghian, Netherlands Organization for Scientific Applied Research, TNO (Netherlands)
Ilan Englard, Process Diagnostics and Control, Applied Materials (Israel)
Dror Shemesh, Process Diagnostics and Control, Applied Materials (Israel)
Nitin Singh Malik, Process Diagnostics and Control, Applied Materials (Israel)


Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Ronald W. Schnabel; Jan Hendrik Peters; Ines A. Stolberg; Hans Loeschner, Editor(s)

© SPIE. Terms of Use
Back to Top