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Proceedings Paper

Half circle chrome loss by electrochemical effects
Author(s): D. Caspary; S. Jähne; P. Nesladek; M. Kristlib; L. Bahrig; A. Feicke; M. Kaiser; J. Lorbeer; T. Wandel
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Paper Abstract

For certain designs, we observe a rather peculiar defect during phase-shift mask production. At distinct positions on the mask, the chrome disappears within the second level process in almost perfect half circles. This effect can even be observed if no etching is applied at all. The root cause of this defect is electrochemical dissolving of chrome in DI water during the development rinse process, which appears at locations where the chrome is in contact to the developer rinse medium. In this publication we describe the experimental set-up to investigate the root cause mechanism and propose solutions to overcome the effect.

Paper Details

Date Published: 28 September 2017
PDF: 11 pages
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460T (28 September 2017); doi: 10.1117/12.2279699
Show Author Affiliations
D. Caspary, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
S. Jähne, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
P. Nesladek, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
M. Kristlib, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
L. Bahrig, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
A. Feicke, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
M. Kaiser, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
J. Lorbeer, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
T. Wandel, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)


Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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