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Proceedings Paper

LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks
Author(s): Hendrik Steigerwald; Runyuan Han; Alexander Buettner; Klaus-Dieter Roeth
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Paper Abstract

SiN-based absorber materials are considered to be the new work horse for cutting-edge patterning using 193-nm immersion lithography. The high robustness against cleaning procedures and the low susceptibility for haze makes SiN an ideal material for phase-shift masks. Reliable metrology with high precision, on target as well as on feature, is enabled by the LMS IPROTM metrology tool. This is achieved by taking into account the optical properties of the novel materials and utilisation of the high-accuracy die-to-database algorithm. Simulation as well as actual measurement results are presented. Cost effectiveness of the LMS IPRO is demonstrated by comparison of high-performance mode results versus high-throughput results, confirming suitable metrology performance for high-volume manufacturing.

Paper Details

Date Published: 13 July 2017
PDF: 6 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540V (13 July 2017); doi: 10.1117/12.2279676
Show Author Affiliations
Hendrik Steigerwald, KLA-Tencor (Germany)
Runyuan Han, KLA-Tencor (Germany)
Alexander Buettner, KLA-Tencor (Germany)
Klaus-Dieter Roeth, KLA-Tencor (Germany)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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