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Etching hard brittle optical materials by masked ion beam
Author(s): Yun Li; Taotao Fu; Jia Xin; Tingwen Xing
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Paper Abstract

The fabrication of small size aspheric optical surface, which made of hard brittle materials, usually uses optical cold processing. However, it is difficult to achieve the ideal requirements of the surface accuracy and roughness. In order to solve this problem, the masked ion beam figuring method is used to etch the one-dimension structure on the plat surface which made of hard brittle material. The results show that the expected surface profile is acquired and meanwhile mainly kept the original roughness and mid-frequency. It provides a possible way for fabricating small size aspheric optics which made of hard brittle materials.

Paper Details

Date Published: 16 October 2017
PDF: 8 pages
Proc. SPIE 10448, Optifab 2017, 1044809 (16 October 2017); doi: 10.1117/12.2279664
Show Author Affiliations
Yun Li, Institute of Optics and Electronics (China)
Taotao Fu, Institute of Optics and Electronics (China)
Jia Xin, Institute of Optics and Electronics (China)
Tingwen Xing, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 10448:
Optifab 2017
Julie L. Bentley; Sebastian Stoebenau, Editor(s)

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