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Proceedings Paper

Challenges for scanning electron microscopy and inspection on the nanometer scale for non-IC application: and how to tackle them using computational techniques
Author(s): Jens Bolten; Kerim T. Arat; Nezih Ünal; Caroline Porschatis; Thorsten Wahlbrink; Max C. Lemme
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Paper Abstract

In this paper key challenges posed on metrology by feature dimensions of 20nm and below are discussed. In detail, the need for software-based tools for SEM image acquisition and image analysis in environments where CD-SEMs are not available and/or not flexible enough to cover all inspection tasks is outlined. These environments include research at universities as well as industrial R and D environments focused on non-IC applications. The benefits of combining automated image acquisition and analysis with computational techniques to simulate image generation in a conventional analytical SEM with respect to the overall reliability, precision and speed of inspection will be demonstrated using real-life inspection tasks as demonstrators.

Paper Details

Date Published: 28 September 2017
PDF: 6 pages
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460G (28 September 2017); doi: 10.1117/12.2279564
Show Author Affiliations
Jens Bolten, AMO GmbH (Germany)
Kerim T. Arat, Delft Univ. of Technology (Netherlands)
Nezih Ünal, GenISys GmbH (Germany)
Caroline Porschatis, AMO GmbH (Germany)
Thorsten Wahlbrink, AMO GmbH (Germany)
Max C. Lemme, AMO GmbH (Germany)
RWTH Aachen Univ. (Germany)

Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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