Share Email Print
cover

Proceedings Paper • new

Strain-free polished channel-cut crystal monochromators: a new approach and results
Author(s): Elina Kasman; Jonathan Montgomery; XianRong Huang; Jason Lerch; Lahsen Assoufid
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The use of channel-cut crystal monochromators has been traditionally limited to applications that can tolerate the rough surface quality from wet etching without polishing. We have previously presented and discussed the motivation for producing channel cut crystals with strain-free polished surfaces [1]. Afterwards, we have undertaken an effort to design and implement an automated machine for polishing channel-cut crystals. The initial effort led to inefficient results. Since then, we conceptualized, designed, and implemented a new version of the channel-cut polishing machine, now called C-CHiRP (Channel-Cut High Resolution Polisher), also known as CCPM V2.0. The new machine design no longer utilizes Figure-8 motion that mimics manual polishing. Instead, the polishing is achieved by a combination of rotary and linear functions of two coordinated motion systems. Here we present the new design of C-CHiRP, its capabilities and features. Multiple channel-cut crystals polished using the C-CHiRP have been deployed into several beamlines at the Advanced Photon Source (APS). We present the measurements of surface finish, flatness, as well as topography results obtained at 1-BM of APS, as compared with results typically achieved when polishing flat-surface monochromator crystals using conventional polishing processes. Limitations of the current machine design, capabilities and considerations for strain-free polishing of highly complex crystals are also discussed, together with an outlook for future developments and improvements.

Paper Details

Date Published: 23 August 2017
PDF: 6 pages
Proc. SPIE 10387, Advances in Laboratory-based X-Ray Sources, Optics, and Applications VI, 103870F (23 August 2017); doi: 10.1117/12.2277605
Show Author Affiliations
Elina Kasman, Argonne National Lab. (United States)
Jonathan Montgomery, Argonne National Lab. (United States)
XianRong Huang, Argonne National Lab. (United States)
Jason Lerch, Argonne National Lab. (United States)
Lahsen Assoufid, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 10387:
Advances in Laboratory-based X-Ray Sources, Optics, and Applications VI
Ali M. Khounsary; Giovanni Pareschi, Editor(s)

© SPIE. Terms of Use
Back to Top