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Proceedings Paper

Fabrication of effective photon trapping and light manipulating micro/nano structures
Author(s): Yang Gao; Hilal Cansizoglu; Soroush Ghandiparsi; Cesar Bartolo-Perez; Ekaterina Ponizovskaya Devine; Aly Elrefaie; Shih-yuan Wang; M. Saif Islam
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Paper Abstract

We present a CMOS compatible fabrication technique to create micro/nanostructures on silicon and germanium surfaces for effective photon trapping and enhanced absorption. We achieved many times of absorption enhancement enabled by these photon trapping micro/nanostructures compared to bulk silicon and germanium counterparts. This method can lead to designing both highly efficient photovoltaics, ultra-fast photodetectors and highly sensitive photon counting devices with dramatically reduced device thickness. We also demonstrate that different fabrication techniques (dry etch, wet etch, and their combination) and different geometries of these micro/nanostructures can affect the ability and extent of the photon trapping and light manipulation in semiconductor.

Paper Details

Date Published: 25 August 2017
PDF: 7 pages
Proc. SPIE 10349, Low-Dimensional Materials and Devices 2017, 103490T (25 August 2017); doi: 10.1117/12.2276503
Show Author Affiliations
Yang Gao, Univ. of California, Davis (United States)
Hilal Cansizoglu, Univ. of California, Davis (United States)
Soroush Ghandiparsi, Univ. of California, Davis (United States)
Cesar Bartolo-Perez, Univ. of California, Davis (United States)
Ekaterina Ponizovskaya Devine, W&WSens Devices, Inc. (United States)
Aly Elrefaie, Univ. of California, Davis (United States)
W&WSens Devices, Inc. (United States)
Shih-yuan Wang, W&WSens Devices, Inc. (United States)
M. Saif Islam, Univ. of California, Davis (United States)


Published in SPIE Proceedings Vol. 10349:
Low-Dimensional Materials and Devices 2017
Nobuhiko P. Kobayashi; A. Alec Talin; M. Saif Islam; Albert V. Davydov, Editor(s)

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