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Side lobe suppression in phase mask-based nonlinear superresolution microscopy
Author(s): Ryan Beams; Stephan J. Stranick
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Paper Abstract

We compare side lobe suppression methods for nonlinear superresolution optical microscopy using phase masked excitation beams. The excitation point spread function (PSF) can be engineered by introducing a phase mask for superresolution microscopy. By applying a single π phase step to the excitation the central spot can be narrowed and provide improved lateral resolution. However, the energy redistribution leads to side lobes with increased intensity that complicates imaging applications. Several methods have been implemented to suppress the strength of the side lobes including confocal detection and utilizing beams with different phase masks in multiphoton microscopy. Side lobe suppression methods using confocal detection and different phase masks for the excitation beams are compared theoretically and experimentally. These results demonstrate the additional flexibility for PSF engineering for nonlinear optical processes.

Paper Details

Date Published: 25 August 2017
PDF: 7 pages
Proc. SPIE 10350, Nanoimaging and Nanospectroscopy V, 1035009 (25 August 2017); doi: 10.1117/12.2275870
Show Author Affiliations
Ryan Beams, National Institute of Standards and Technology (United States)
Stephan J. Stranick, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 10350:
Nanoimaging and Nanospectroscopy V
Prabhat Verma; Alexander Egner, Editor(s)

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