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Proceedings Paper

In-situ stress measurement of single and multilayer thin-films used in x-ray astronomy optics applications
Author(s): David M. Broadway; Brian D. Ramsey; Stephen L. O'Dell; Danielle Gurgew
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Paper Abstract

We present in-situ stress measurement results for single and multilayer thin-films deposited by magnetron sputtering. In particular, we report on the influence of the material interfaces on the ensuing stress in both the transient and steady-state regimes of film growth. This behavior is used to determine the appropriate thicknesses of the constituent layers that will result in a net tensile stress in multilayers composed of various material combinations. These multilayers can then be used to compensate the compressive integrated stress in single and multilayer EUV and x-ray optical coatings. The use of multilayers to compensate the integrated stress might be advantageous because, unlike single layers of chromium, the roughness is not expected to increase with the total thickness of the multilayer. In this paper, we demonstrate the technique for W/Si and Mo/Si multilayers and discuss its application to other material combinations.

Paper Details

Date Published: 8 September 2017
PDF: 7 pages
Proc. SPIE 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII, 103991B (8 September 2017); doi: 10.1117/12.2275558
Show Author Affiliations
David M. Broadway, NASA Marshall Space Flight Ctr. (United States)
Brian D. Ramsey, NASA Marshall Space Flight Ctr. (United States)
Stephen L. O'Dell, NASA Marshall Space Flight Ctr. (United States)
Danielle Gurgew, The Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 10399:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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