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Proceedings Paper

Nano-diamond polishing of super hard materials (Conference Presentation)
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Paper Abstract

A new nano-diamond based mechanical polishing process has been developed and optimized for polishing super hard materials such as SiC, sapphire and diamond samples. The nano-diamond based process uses specially engineered nano-diamond particles that has ability to react with super hard materials when used for polishing. Such a reactive nano-diamond process leads to removal rates of about an order higher than the base particles and yields ultra-smooth surfaces (RMS <0.5nm) on the super hard materials along with very low sub-surface damage. The process yielded surface roughness less than 1 nm for silicon carbide, sapphire and diamond materials. The process has been studied for single crystalline, poly-crystalline and composite materials. The removal rates for different materials with the newly developed nano-diamond process compared to base nano-diamond particles and the surface finish obtained with the use of atomic force microscope, optical interferometer and tropel flat master will be presented. The mechanism of nano-diamond process will be explained in the conference.

Paper Details

Date Published: 25 September 2017
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Proc. SPIE 10372, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems III, 103720C (25 September 2017); doi: 10.1117/12.2275080
Show Author Affiliations
Rajiv Singh, Sinmat, Inc. (United States)
Arul Chakkaravarthi Arjunan, Sinmat, Inc. (United States)


Published in SPIE Proceedings Vol. 10372:
Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems III
Matthias Krödel; Joseph L. Robichaud; Bill A. Goodman, Editor(s)

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