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Electrostatic microcolumns for surface plasmon enhanced electron beamlets
Author(s): Zhidong Du; Chen Chen; Liang Pan
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Paper Abstract

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of a large array of electrostatic microcolumns for our recent surface plasmon enhanced photoemission sources is optimized numerically. Because of the compactness, one million of microcolumns can be put within 1 cm2 area. To avoid the trade-off between resolution and throughput, each microcolumn has one beamlet and there is no crossing point between any of the beamlets. An aperture self-aligned fabrication process is developed to make the optimized microcolumns.

Paper Details

Date Published: 25 August 2017
PDF: 10 pages
Proc. SPIE 10346, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XV, 1034608 (25 August 2017); doi: 10.1117/12.2273492
Show Author Affiliations
Zhidong Du, Purdue Univ. (United States)
Chen Chen, Purdue Univ. (United States)
Liang Pan, Purdue Univ. (United States)


Published in SPIE Proceedings Vol. 10346:
Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XV
Din Ping Tsai; Takuo Tanaka, Editor(s)

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