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Proceedings Paper

Mask in thickness uniformity for three coating materials
Author(s): Cheng-Chung Jaing; Kai-Lun Wu; Jing-Han Xie; Jian-Wei Chen; Yeuh-Yeong Liou; Pang-Shiu Chen
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Paper Abstract

In this study, a mask suitable for three materials evaporated from one single e-beam source is developed to obtain uniform thickness distribution. The design method is based on film thickness theory and the assumption that a substrate holder rotates about its central axis during the deposition of films. The uniform thickness distributions of the SiO2, TiO2 and Ag films deposited with the designed mask are achieved in an e-beam evaporation chamber. The design of a mask in thickness uniformity for three coating materials cuts the development time and requires less trial and error than traditionally experimental correction loops.

Paper Details

Date Published: 23 August 2017
PDF: 7 pages
Proc. SPIE 10375, Current Developments in Lens Design and Optical Engineering XVIII, 1037511 (23 August 2017); doi: 10.1117/12.2273277
Show Author Affiliations
Cheng-Chung Jaing, Minghsin Univ. of Science and Technology (Taiwan)
Kai-Lun Wu, Minghsin Univ. of Science and Technology (Taiwan)
Jing-Han Xie, Minghsin Univ. of Science and Technology (Taiwan)
Jian-Wei Chen, Minghsin Univ. of Science and Technology (Taiwan)
Yeuh-Yeong Liou, Chienkuo Technology Univ. (Taiwan)
Pang-Shiu Chen, Minghsin Univ. of Science and Technology (Taiwan)


Published in SPIE Proceedings Vol. 10375:
Current Developments in Lens Design and Optical Engineering XVIII
R. Barry Johnson; Virendra N. Mahajan; Simon Thibault, Editor(s)

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