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Proceedings Paper

Thickness uniformity study on the ESRF multilayer deposition system
Author(s): Damien Carau; Jean-Christophe Peffen; Christian Morawe
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Paper Abstract

The ESRF Multilayers Laboratory provides reflective optics in the X-ray domain using a deposition system where silicon substrates are coated with a well-defined multilayers stack. The multilayers period is used to tune the photon energy of the reflected X-ray beam. In some applications, the variation of the thickness profiles of the deposited materials must not exceed 0.1%. The aim of the study is to quantify the thickness uniformity of 1.2 m long single layer coatings with a spatial resolution of 10 mm or better. Results have been analyzed to identify potential sources of thickness variations. Investigations of long multilayers coatings complement this work.

Paper Details

Date Published: 23 August 2017
PDF: 10 pages
Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860V (23 August 2017); doi: 10.1117/12.2273273
Show Author Affiliations
Damien Carau, ESRF - The European Synchrotron (France)
Jean-Christophe Peffen, ESRF - The European Synchrotron (France)
Christian Morawe, ESRF - The European Synchrotron (France)

Published in SPIE Proceedings Vol. 10386:
Advances in X-Ray/EUV Optics and Components XII
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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