Share Email Print
cover

Proceedings Paper

Thickness uniformity study on the ESRF multilayer deposition system
Author(s): Damien Carau; Jean-Christophe Peffen; Christian Morawe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The ESRF Multilayers Laboratory provides reflective optics in the X-ray domain using a deposition system where silicon substrates are coated with a well-defined multilayers stack. The multilayers period is used to tune the photon energy of the reflected X-ray beam. In some applications, the variation of the thickness profiles of the deposited materials must not exceed 0.1%. The aim of the study is to quantify the thickness uniformity of 1.2 m long single layer coatings with a spatial resolution of 10 mm or better. Results have been analyzed to identify potential sources of thickness variations. Investigations of long multilayers coatings complement this work.

Paper Details

Date Published: 23 August 2017
PDF: 10 pages
Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860V (23 August 2017); doi: 10.1117/12.2273273
Show Author Affiliations
Damien Carau, ESRF - The European Synchrotron (France)
Jean-Christophe Peffen, ESRF - The European Synchrotron (France)
Christian Morawe, ESRF - The European Synchrotron (France)


Published in SPIE Proceedings Vol. 10386:
Advances in X-Ray/EUV Optics and Components XII
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

© SPIE. Terms of Use
Back to Top