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Proceedings Paper

Focus of a multilayer Laue lens with an aperture of 102 microns determined by ptychography at beamline 1-BM at the Advanced Photon Source
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Paper Abstract

Ptychography was used to determine the focus of a Multilayer-Laue-Lens (MLL) at beamline 1-BM at the Advanced Photon Source (APS). The MLL had a record aperture of 102 microns with 15170 layers. The measurements were made at 12 keV. The focal length was 9.6 mm, and the outer-most zone was 4 nm thick. MLLs with ever larger apertures are under continuous development since ever longer focal lengths, ever larger working distances, and ever increased flux in the focus are desired. A focus size of 25 nm was determined by ptychographic phase retrieval from a gold grating sample with 1 micron lines and spaces over 3.0 microns horizontal distance. The MLL was set to focus in the horizontal plane of the bending magnet beamline. A CCD with 13.0 micron pixel size positioned 1.13 m downstream of the sample was used to collect the transmitted intensity distribution. The beam incident on the MLL covered the whole 102 micron aperture in the horizontal focusing direction and 20 microns in the vertical direction. 160 iterations of the difference map algorithm were sufficient to obtain a reconstructed image of the sample. The present work highlights the utility of a bending magnet source at the APS for performing coherence-based experiments. Use of ptychography at 1-BM on MLL optics opens the way to study diffraction-limited imaging of other hard x-ray optics.

Paper Details

Date Published: 7 September 2017
PDF: 6 pages
Proc. SPIE 10389, X-Ray Nanoimaging: Instruments and Methods III, 1038909 (7 September 2017); doi: 10.1117/12.2272842
Show Author Affiliations
Albert Macrander, Argonne National Lab. (United States)
Michael Wojcik, Argonne National Lab. (United States)
Jörg Maser, Argonne National Lab. (United States)
Nathalie Bouet, Brookhaven National Lab. (United States)
Raymond Conley, Argonne National Lab. (United States)
Brookhaven National Lab. (United States)
Barry Lai, Argonne National Laboratory (United States)


Published in SPIE Proceedings Vol. 10389:
X-Ray Nanoimaging: Instruments and Methods III
Barry Lai; Andrea Somogyi, Editor(s)

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