Share Email Print
cover

Proceedings Paper • new

X-ray multilayer mid-frequency characterizations using speckle scanning techniques
Author(s): Hui Jiang; Shuai Yan; Dongxu Liang; Naxi Tian; Hua Wang; Aiguo Li
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Determination of multilayer structure was developed so much, but most of studies focused on the relationship between structural imperfections and reflectivity. These imperfections, whether interfacial roughness and interdiffusion or surface feature, measured by grazing X-ray scattering, atomic force microscopy or electric microscopy, reflect relatively high-frequency characteristics. The mid-frequency figure errors were regarded as the main factor to produce large satellite peaks near the focusing spot in the multilayer K-B mirror and were found to produce stripes in the far-field imaging. We report novel method to study mid-frequency interface and layer growth characterizations of multilayer structure using at-wavelength speckle scanning technique. This work is beneficial for matching multilayer manufacture technology to the optimization of beam performances.

Paper Details

Date Published: 7 September 2017
PDF: 7 pages
Proc. SPIE 10385, Advances in Metrology for X-Ray and EUV Optics VII, 103850Q (7 September 2017); doi: 10.1117/12.2272194
Show Author Affiliations
Hui Jiang, Shanghai Institute of Applied Physics (China)
Shuai Yan, Shanghai Institute of Applied Physics (China)
Dongxu Liang, Shanghai Institute of Applied Physics (China)
Naxi Tian, Shanghai Institute of Applied Physics (China)
Hua Wang, Shanghai Institute of Applied Physics (China)
Aiguo Li, Shanghai Institute of Applied Physics (China)


Published in SPIE Proceedings Vol. 10385:
Advances in Metrology for X-Ray and EUV Optics VII
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

© SPIE. Terms of Use
Back to Top